Maximization of the InAs quantum-dot density through the growth of an intentionally non-homogeneous sample

被引:19
作者
da Silva, MJ
Quivy, AA
González-Borrero, PP
Marega, E
机构
[1] Univ Sao Paulo, Inst Fis, Lab Novos Mat Semicondutores, BR-05315970 Sao Paulo, Brazil
[2] Univ Sao Paulo, Inst Fis & Quim, BR-13560970 Sao Carlos, SP, Brazil
基金
巴西圣保罗研究基金会;
关键词
atomic force microscopy; nanostructures; molecular beam epitaxy; semiconducting III-V compounds; semiconducting indium compounds;
D O I
10.1016/S0022-0248(01)02109-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We investigated the maximum density of InAs quantum dots grown by molecular beam epitaxy on GaAs(0 0 1) substrates. Different from most current work, we took advantage of the non-uniformity of the molecular beams to produce a sample in which the amount of InAs material was continuously varied across the surface in order to analyze the evolution of the QDs as a function of the film thickness. A density of structures as high as 1800 mum(-2) could be observed by atomic force microscopy and is around twice the maximum value typically reported in the literature. No loss of size uniformity was detected for such a high density. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:41 / 45
页数:5
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