Ion-beam-assisted fabrication and manipulation of metallic nanowires

被引:6
作者
Rajput, N. S. [1 ,2 ]
Tong, Z. [2 ]
Verma, H. C. [1 ]
Luo, X. [2 ]
机构
[1] Indian Inst Technol Kanpur, Dept Phys, Kanpur 208016, Uttar Pradesh, India
[2] Univ Strathclyde, Dept Design Mfg & Engn Management, Glasgow G1 1XQ, Lanark, Scotland
基金
英国工程与自然科学研究理事会;
关键词
nanowires; nanofabrication; etching; ion beam effects; ion-beam-assisted fabrication; metallic nanowires; chemical etching; ion beam milling; shape modihcation; ion beam irradiation; bending effect; ion beam-assisted shape manoeuvre; metallic structures; ion-induced vacancy formation; damaged layer reconfiguration; strain formation process; nanoscale metals; BUILDING-BLOCKS;
D O I
10.1049/mnl.2014.0267
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Metallic nanowires (NWs) are the key performers for future micro/nanodevices. The controlled manoeuvring and integration of such nanoscale entities are essential requirements. Presented is a discussion of a fabrication approach that combines chemical etching and ion beam milling to fabricate metallic NWs. The shape modification of the metallic NWs using ion beam irradiation (bending towards the ion beam side) is investigated. The bending effect of the NWs is observed to be instantaneous and permanent. The ion beam-assisted shape manoeuvre of the metallic structures is studied in the light of ion-induced vacancy formation and reconfiguration of the damaged layers. The manipulation method can be used for fabricating structures of desired shapes and aligning structures at a large scale. The controlled bending method of the metallic NWs also provides an understanding of the strain formation process in nanoscale metals.
引用
收藏
页码:334 / 338
页数:5
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