Directed Self-Assembly of Block Copolymers on Sparsely Nanopatterned Substrates

被引：21
|
作者：
Chen, Peng [1 ,5 ]
Liang, Haojun [2 ,3 ]
Xia, Ru [1 ,5 ]
Qian, Jiasheng [1 ,5 ]
Feng, Xiaoshuang [1 ,4 ,5 ]
机构：
[1] Anhui Univ, Sch Chem & Chem Engn, Hefei 230039, Peoples R China
[2] Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China
[3] Univ Sci & Technol China, Dept Polymer Sci & Engn, Hefei 230026, Anhui, Peoples R China
[4] Rhodia China Co Ltd, CRTS, Ecoefficient Prod & Proc Lab E2P2L, UMI 3464, Shanghai 201108, Peoples R China
[5] Anhui Univ, Anhui Prov Key Lab Environm Friendly Polymer Mat, Hefei 230039, Peoples R China
来源：
MACROMOLECULES | 2013年 / 46卷 / 03期
基金：
中国国家自然科学基金; 高等学校博士学科点专项科研基金;
关键词：
SYMMETRIC DIBLOCK COPOLYMER; PATTERNED SURFACES; MORPHOLOGY; BLENDS; NANOLITHOGRAPHY; ORIENTATION; FILMS; FIELD;
D O I：
10.1021/ma301203a
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.
引用
收藏
页码：922 / 926
页数：5
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