Nonstoichiometric doping and Bi antisite defect in single crystal Bi2Se3

被引:60
作者
Huang, F. -T. [1 ]
Chu, M. -W. [1 ]
Kung, H. H. [2 ]
Lee, W. L. [2 ]
Sankar, R. [1 ]
Liou, S. -C. [1 ]
Wu, K. K. [1 ,3 ]
Kuo, Y. K. [3 ]
Chou, F. C. [1 ,4 ,5 ]
机构
[1] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10617, Taiwan
[2] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
[3] Natl Dong Hwa Univ, Dept Phys, Hualien 97401, Taiwan
[4] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
[5] Natl Taiwan Univ, Ctr Emerging Mat & Adv Devices, Taipei 10617, Taiwan
关键词
TOPOLOGICAL INSULATOR;
D O I
10.1103/PhysRevB.86.081104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the defects of Bi2Se3 generated from Bridgman growth of stoichiometric and nonstoichiometric self-fluxes. Growth habit, lattice size, and transport properties are strongly affected by the types of defects generated. Major defect types of the Bi-Se antisite and partial Bi-2-layer intercalation are identified through combined studies of direct atomic-scale imaging with scanning transmission electron microscopy in conjunction with energy-dispersive x-ray spectroscopy, x-ray diffraction, and Hall effect measurements. We propose a consistent explanation to the origin of defect type, growth morphology, and transport property.
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页数:5
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