The initial oxidation of ε-Fe2N1-x:: growth kinetics

被引：13
|
作者：
Graat, PCJ
Somers, MAJ
Mittemeijer, EJ
机构：
[1] Delft Univ Technol, Mat Sci Lab, NL-2628 AL Delft, Netherlands
[2] Max Planck Inst Met Res, D-70174 Stuttgart, Germany
[3] Tech Univ Denmark, IPT Mat Technol, DK-2800 Lyngby, Denmark
来源：
THIN SOLID FILMS | 1999年 / 353卷 / 1-2期
关键词：
ellipsometry; iron; nitrides; nitrogen; oxidation;
D O I：
10.1016/S0040-6090(99)00377-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The oxidation kinetics of epsilon-Fe2N1-x, subjected either to a sputter cleaning pretreatment or a sputter cleaning and an additional annealing pretreatment, at P-O2 = 1 x 10(-4) Pa and at temperatures ranging from 300 to 500 K, was investigated with ellipsometry. The initial oxidation rate of sputter cleaned + annealed epsilon-Fe2N1-x was observed to be lower than of sputter cleaned epsilon-Fe2N1-x, but upon prolonged oxidation sputter cleaned + annealed epsilon-Fe2N1-x attained a higher oxidation rate than sputter cleaned epsilon-Fe2N1-x. The oxidation kinetics was interpreted using the model due to Fromhold and Cook wherein cation and electron currents in the growing oxide film are coupled. The effect of the nitrogen concentration in the iron-nitride substrate on the oxidation kinetics could be discussed in terms of this model and related to the morphology and phase constitution of the oxide film. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：72 / 78
页数：7
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