Interface properties between Ni and p-GaN studied by photoemission spectroscopy

被引:5
作者
Hagio, Y
Sugahara, H
Maruyama, T
Nanishi, Y
Akimoto, K
Miyajima, T
Kijima, S
机构
[1] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[2] Ritsumeikan Univ, Dept Photon, Kusatsu, Shiga 5258577, Japan
[3] Sony Corp, Res Ctr, Atsugi, Kanagawa 2430014, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2002年 / 41卷 / 4B期
关键词
annealing; GaN; island formation; ohmic contact; photoemission spectroscopy; surface cleaning;
D O I
10.1143/JJAP.41.2493
中图分类号
O59 [应用物理学];
学科分类号
摘要
Interface properties between p-GaN and Ni were investigated by vacuum ultra violet photoemission spectroscopy and atomic force microscopy. It was found that residual oxide on the GaN surface was removed by Ni deposition and subsequent annealing, and the layered Ni became an island-like shape with annealing in O-2 ambient. Such annealing effects result in the direct contact of Au with atomically clean GaN in a Au/Ni/p-GaN structure. On the basis of these results, it can be concluded that the cleaning effect of Ni and island formation of oxidized Ni may play an important role in forming an ohmic contact to p-GaN.
引用
收藏
页码:2493 / 2496
页数:4
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