Minimizing Fizeau fringes during the contact printing of diffraction gratings

被引：0

作者：

Ciarlo, D ^{[1
]}

Rushford, M ^{[1
]}

Kuzmenko, P ^{[1
]}

Ge, J ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA

来源：

LITHOGRAPHIC AND MICROMACHINING TECHNIQUES FOR OPTICAL COMPONENT FABRICATION | 2001年 / 4440卷

关键词：

GRISM; index; matching; Fizeau; interference; fringes; diffraction; gratings; silicon; astronomy;

D O I：

10.1117/12.448041

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.

引用

页码：202 / 208

页数：7

共 47 条

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