Surface modification of ITO anode by supercritical CO2/H2O2 treatment for organic light-emitting diodes

被引：0

作者：

Tien, W. C. ^{[1
]}

Chu, A. K. ^{[1
]}

Lu, J. A. ^{[1
]}

Chang, M. Y. ^{[1
]}

Zheng, W. J. ^{[1
]}

Chuang, M. J. ^{[2
]}

Chao, C. M. ^{[1
]}

Huang, W. Y. ^{[1
]}

机构：

[1] Natl Sun Yat Sen Univ, Dept Photon, Kaohsiung 80424, Taiwan

[2] Chien Kuo Technol Univ, Inst Mechatronopt Syst, Changhua, Taiwan

来源：

2012 19TH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD): TFT TECHNOLOGIES AND FPD MATERIALS | 2012年

关键词：

TIN-OXIDE ANODES; PERFORMANCE;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A simple method is proposed as an alternative to conventional oxygen plasma treatment to modify surface property of ITO anode of a fluorescent OLED. This was achieved by treating the ITO anode in supercritical CO2 (SCCO2) fluid with H2O2. The SCCO2/H2O2 treatments yielded an ITO work function of 5.35 eV after 15 min treatment at 85 degrees C and 4000 psi, which was significant higher than 4.8 eV of the as-cleaned ITO surface. In addition, performance of OLEDs fabricated on the ITO anodes with and without the treatments was investigated. The maximum power efficiency of 1.94 lm/W was obtained at 17.3 mA/cm(2) for the device with 15 min SCCO2/H2O2 treatment at 4000 psi. This power efficiency was 19.3% and 33.8% higher than those of the oxygen plasma treatment and as-clean, respectively.

引用

页码：95 / 98

页数：4

共 13 条

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