Perpendicular uniaxial magnetic anisotropy of Fe16N2(001) single crystal films grown by molecular beam epitaxy.

被引:48
作者
Takahashi, H [1 ]
Igarashi, M
Kaneko, A
Miyajima, H
Sugita, Y
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
[2] Keio Univ, Dept Phys, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
[3] Tohoku Univ, Elect Commun Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
Fe16N2; ferromagnetic resonance; perpendicular uniaxial anisotropy; saturation magnetic flux density;
D O I
10.1109/20.801054
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The uniaxial magnetic anisotropies by torque measurement have been measured for Fe16N2(001) single crystal films grown by molecular beam epitaxy (MBE). It has been found that Fe16N2(001) films exhibits perpendicular uniaxial anisotropy which makes the easy axis along the [001] direction, and those anisotropy constants K-U1 and K-U1 for Fe16N2 were 1.6 X 10(7) and 0.4 X 10(7) erg/cm(3), respectively. Those K-U1 and K-U2 for Fe16N2 were constant in the thickness range from 34 to 83nm, The ferromagnetic resonance of Fe16N2(001) single crystal films have been measured. The saturation magnetic flux densities, 4 pi M-S for Fe16N2 measured by the magnetic torques and resonance fields agreed well with the values measured with a vibrating sample magnetometer (VSM).
引用
收藏
页码:2982 / 2984
页数:3
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