New electron and hole traps in GaAsP alloy

被引:1
|
作者
Teo, KL [1 ]
Li, MF [1 ]
Goo, CH [1 ]
Lau, WS [1 ]
Lim, YT [1 ]
机构
[1] HEWLETT PACKARD SINGAPORE, SINGAPORE 0410, SINGAPORE
关键词
D O I
10.1080/002072197135616
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two electron traps and a hole trap have been observed in vapour phase epitaxial GaAs0.6P0.4 materials by deep level transient spectroscopy. The dominant electron trap A, which has never previously been reported, has a thermal emission activation energy of E-e(A) = 0.83 eV and an abnormally large capture activation energy E-c(A) = 0.73 eV. Hole trap C with thermal emission activation energy of E-e(C) = 0.65 eV is also new and different from previous reports. A critical comparison of traps reported in this work with traps reported in the existing literature is also made.
引用
收藏
页码:29 / 35
页数:7
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