Combining UV Lithography and an Imprinting Technique for Patterning Metal-Organic Frameworks

被引：103

作者：

Doherty, Cara M. ^{[1
]}

Grenci, Gianluca ^{[2
]}

Ricco, Raffaele ^{[1
]}

Mardel, James I. ^{[1
]}

Reboul, Julien ^{[3
]}

Furukawa, Shuhei ^{[3
]}

Kitagawa, Susumu ^{[3
]}

Hill, Anita J. ^{[1
]}

Falcaro, Paolo ^{[1
]}

机构：

[1] CSIRO Div Mat Sci & Engn CMSE, Clayton, Vic 3169, Australia

[2] CMR IOM, Lab TASC, I-34149 Trieste, Italy

[3] Kyoto Univ, Inst Integrated Cell Mat Sci WPI iCeMS, Sakyo Ku, Kyoto 6068501, Japan

来源：

ADVANCED MATERIALS | 2013年 / 25卷 / 34期

基金：

澳大利亚研究理事会;

关键词：

UV lithography; metal-organic frameworks; device fabrication; patterning; imprinting; THIN-FILMS; MOF; MICROFABRICATION; WATER;

D O I：

10.1002/adma.201301383

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：4701 / 4705

页数：5

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