Influence of pulse temporal manipulation on the properties of laser ablated Si ion beams

被引：17
|
作者：
Koudoumas, E
Spyridaki, M
Stoian, R
Rosenfeld, A
Tzanetakis, P
Hertel, IV
Fotakis, C
机构：
[1] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, GR-71110 Iraklion, Crete, Greece
[2] Max Born Inst Nichtlineare Opt & Kurzzeitspektros, D-12489 Berlin, Germany
[3] TEI Crete, Dept Elect Engn, Iraklion 71500, Crete, Greece
[4] Univ Crete, Dept Phys, Iraklion, Greece
[5] Natl Inst Laser Plasma & Radiat Phys, Bucharest 76900, Romania
[6] Free Univ Berlin, Fachbereich Phys, D-1000 Berlin, Germany
来源：
THIN SOLID FILMS | 2004年 / 453卷
关键词：
ion beams; laser ablation; temporal pulse shaping;
D O I：
10.1016/j.tsf.2003.11.111
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Experimental results are reported describing the influence of laser pulse temporal manipulation on the properties of ion beams generated by ultrafast laser ablation of Si. The introduction of a second laser pulse after an appropriate time delay on the order of picoseconds is shown to influence the ion yield and the kinetic energy distribution of the ablated species. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：372 / 376
页数：5
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