Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures

被引:0
|
作者
Hippler, Rainer [1 ,2 ]
Cada, Martin [1 ]
Hubicka, Zdenek [1 ]
机构
[1] Czech Acad Sci, Inst Phys, Na Slovance 2, Prague 18221, Czech Republic
[2] Univ Greifswald, Inst Phys, Felix Hausdorff Str 6, D-17489 Greifswald, Germany
来源
EUROPEAN PHYSICAL JOURNAL D | 2022年 / 76卷 / 11期
关键词
ELECTRON-IMPACT IONIZATION; CROSS-SECTIONS; THIN-FILMS; DEPOSITION; ATOMS; RF; SILICON; GLOW;
D O I
10.1140/epjd/s10053-022-00539-8
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A hollow cathode discharge with a Ti cathode and a positively biased ring anode was operated in Ar + N-2 or Ar + O-2 gas mixtures. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly and doubly charged Ar+ and Ar2+ ions and molecular N-2(+) or O(2)(+ )ions are the most abundant ionic species. The kinetic energy of all plasma ions is enhanced by a positive anode voltage.
引用
收藏
页数:7
相关论文
共 50 条
  • [1] A Pulsed Hollow Cathode Discharge Operated in an Ar/N2/O2 Gas Mixture and the Formation of Nitric Oxide
    Hippler, Rainer
    Cada, Martin
    Knizek, Antonin
    Ferus, Martin
    Hubicka, Zdenek
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2024, 44 (02) : 1053 - 1068
  • [2] Measurement of ion temperature in N2/Ar and O2/Ar ECR plasma
    Koga, M
    Iwata, S
    Muta, H
    Yonesu, A
    Kawai, Y
    VACUUM, 2004, 74 (3-4) : 491 - 495
  • [4] Experimental study of NO2 reduction in N2/Ar and O2/Ar mixtures by pulsed corona discharge
    Zhu, Xinbo
    Zheng, Chenghang
    Gao, Xiang
    Shen, Xu
    Wang, Zhihua
    Luo, Zhongyang
    Cen, Kefa
    JOURNAL OF ENVIRONMENTAL SCIENCES, 2014, 26 (11) : 2249 - 2256
  • [5] Experimental study of NO2 reduction in N2/Ar and O2/Ar mixtures by pulsed corona discharge
    Xinbo Zhu
    Chenghang Zheng
    Xiang Gao
    Xu Shen
    Zhihua Wang
    Zhongyang Luo
    Kefa Cen
    Journal of Environmental Sciences, 2014, 26 (11) : 2249 - 2256
  • [6] Electron density measurement of Ar, N2, O2, and Ar mixtures (with N2 and O2) gas in inductively coupled plasma (ICP) using terahertz time domain spectroscopy
    Kim, Sang-Il
    Park, Dong-Woon
    Kim, Heon-Su
    Kim, Hak-Sung
    OPTICS AND LASER TECHNOLOGY, 2025, 180
  • [7] Technical characteristics of a DC plasma jet with Ar/N2 and O2/N2 gaseous mixtures
    Barkhordari, Ali
    Ganjovi, Alireza
    CHINESE JOURNAL OF PHYSICS, 2019, 57 : 465 - 478
  • [8] Stripping of photoresist using a remote thermal Ar/O2 and Ar/N2/O2 plasma
    Brussaard, GJH
    Letourneur, KGY
    Schaepkens, M
    van de Sanden, MCM
    Schram, DC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01): : 61 - 66
  • [9] Effect of O2, N2, Ar, and Ar/O2 Plasma Treatment on Optical Properties of Polyaniline Films
    Khalaf, Mohammed K.
    Ali, Iman A. Mohammed
    Dathaan, Muhammed Jwair.
    Hamil, Muslim Idan
    EGYPTIAN JOURNAL OF CHEMISTRY, 2021, 64 (09): : 5111 - 5115
  • [10] A comparison between micro hollow cathode discharges and atmospheric pressure plasma jets in Ar/O2 gas mixtures
    Lazzaroni, C.
    Chabert, P.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (06):