Plasma parameters analysis of various mixed gas inductively coupled plasmas

被引:32
作者
Bai, KH [1 ]
You, SJ
Chang, HY
Uhm, HS
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
关键词
D O I
10.1063/1.1475311
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The electron energy distribution functions and plasma parameters in various gas mixture discharges (N-2,O-2,CF4/He,Ar,Xe) are measured. When He is mixed, the electron temperature increases but the electron density is almost constant. The electron temperature increases rapidly near a He mixing ratio of 1, but it is almost constant when the mixing ratio is small. In Ar mixture discharge, the electron temperature is almost constant; the electron density increases rapidly near a mixing ratio of 1, but increases slightly when the mixing ratio is small. Mixing Xe increases the electron density and decreases the electron temperature. The electron density varies in a similar way with that of the Ar mixing case. A simple two-ion-species global model is used to analyze the plasma parameter variations as a function of mixing ratio, and it agrees well with the experimental results. (C) 2002 American Institute of Physics.
引用
收藏
页码:2831 / 2838
页数:8
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