Hydrazine-based n-type doping process to modulate Dirac point of graphene and its application to complementary inverter

被引:27
作者
Lee, In-Yeal [1 ]
Park, Hyung-Youl [1 ]
Park, Jin-Hyung [1 ]
Lee, Jinyeong [2 ]
Jung, Woo-Shik [3 ]
Yu, Hyun-Yong [4 ]
Kim, Sang-Woo [2 ]
Kim, Gil-Ho [1 ]
Park, Jin-Hong [1 ]
机构
[1] Sungkyunkwan Univ, SKKU Samsung Graphene Ctr, SKKU Adv Inst Nanotechnol SAINT, Sch Elect & Elect Engn, Suwon 440746, South Korea
[2] Sungkyunkwan Univ, SKKU Samsung Graphene Ctr, SKKU Adv Inst Nanotechnol SAINT, Sch Adv Mat Sci & Engn,Ctr Human Interface Nanote, Suwon 440746, South Korea
[3] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[4] Korea Univ, Sch Elect Engn, Seoul 136701, South Korea
基金
新加坡国家研究基金会;
关键词
Graphene; N-doping; Hydrazine; Inverter;
D O I
10.1016/j.orgel.2013.03.022
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, chemical n-type doping process of graphene using hydrazine monohydrate solution (N2H4-H2O) is demonstrated. This method successfully modulates the Dirac point of pristine graphene by adjusting the concentration of hydrazine solution and also provides an effective n-type doping in graphene. First, the hydrazine treated and pristine graphene films are systematically investigated by Raman and FT-IR spectroscopy. Second, with p-and n-channel FETs fabricated on both pristine and hydrazine treated n-type graphene, complementary graphene inverter is demonstrated. (C) 2013 Elsevier B. V. All rights reserved.
引用
收藏
页码:1586 / 1590
页数:5
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