Reliability Assessment and Activation Energy Study of Au and Pd-Coated Cu Wires Post High Temperature Aging in Nanoscale Semiconductor Packaging

被引:14
作者
Gan, C. L. [1 ,2 ]
Hashim, U. [2 ]
机构
[1] Spans Penang Sdn Bhd, Bayan Lepas 11900, Penang, Malaysia
[2] Univ Malaysia Perlis, INEE, Kangar 01000, Perlis, Malaysia
关键词
wearout reliability; apparent activation energy; high temperature storage life; arrhenius plot; lognormal plot; semiconductor device; COPPER WIRE; INTERMETALLIC COMPOUNDS; BALL BONDS; GOLD; GROWTH; BEHAVIOR;
D O I
10.1115/1.4024013
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Wearout reliability and high temperature storage life (HTSL) activation energy of Au and Pd-coated Cu (PdCu) ball bonds are useful technical information for Cu wire deployment in nanoscale semiconductor device packaging. This paper discusses the influence of wire type on the wearout reliability performance of Au and PdCu wire used in fine pitch BGA package after HTSL stress at various aging temperatures. Failure analysis has been conducted to identify the failure mechanism after HTSL wearout conditions for Au and PdCu ball bonds. Apparent activation energies (Eaa) of both wire types are investigated after HTSL test at 150 degrees C, 175 degrees C and 200 degrees C aging temperatures. Arrhenius plot has been plotted for each ball bond types and the calculated Eaa of PdCu ball bond is 0.85 eV and 1.10 eV for Au ball bond in 110 nm semiconductor device. Obviously Au ball bond is identified with faster IMC formation rate with IMC Kirkendall voiding while PdCu wire exhibits equivalent wearout and or better wearout reliability margin compare to conventional Au wirebond. Lognormal plots have been established and its mean to failure (t(50)) have been discussed in this paper.
引用
收藏
页数:7
相关论文
共 26 条
[1]   Oxidation of Au4Al in un-moulded gold ballbonds after high temperature storage (HTS) in air at 175 °C [J].
Breach, C. D. ;
Wulff, F. .
MICROELECTRONICS RELIABILITY, 2006, 46 (12) :2112-2121
[2]   New observations on intermetallic compound formation in gold ball bonds:: general growth patterns and identification of two forms of Au4Al [J].
Breach, CD ;
Wulff, F .
MICROELECTRONICS RELIABILITY, 2004, 44 (06) :973-981
[3]  
Classe F. C., 2011, IEEE INT REL PHYS S
[4]  
Gan C. L., 2012, 2012 7th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), P232, DOI 10.1109/IMPACT.2012.6420213
[5]  
Gan C. L., 2012, 2012 7th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), P236, DOI 10.1109/IMPACT.2012.6420214
[6]   Technical Barriers and Development of Cu Wirebonding in Nanoelectronics Device Packaging [J].
Gan, C. L. ;
Ng, E. K. ;
Chan, B. L. ;
Hashim, U. ;
Classe, F. C. .
JOURNAL OF NANOMATERIALS, 2012, 2012
[7]  
Gan C. L., 2010, 34 IEEE CPMT INT EL
[8]   Growth behavior of Cu/Al intermetallic compounds and cracks in copper ball bonds during isothermal aging [J].
Hang, C. J. ;
Wang, C. Q. ;
Mayer, M. ;
Tian, Y. H. ;
Zhou, Y. ;
Wang, H. H. .
MICROELECTRONICS RELIABILITY, 2008, 48 (03) :416-424
[9]  
Harman G. G., 1989, WIREBONDING MICROELE, P50
[10]  
JEDEC Specification, 2010, 1222010 JEDEC JEP