The role of Ohmic heating in dc magnetron sputtering

被引:38
作者
Brenning, N. [1 ,2 ,3 ]
Gudmundsson, J. T. [2 ,3 ,4 ]
Lundin, D. [3 ]
Minea, T. [3 ]
Raadu, M. A. [2 ]
Helmersson, U. [1 ]
机构
[1] Linkoping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linkoping, Sweden
[2] KTH Royal Inst Technol, Sch Elect Engn, Dept Space & Plasma Phys, SE-10044 Stockholm, Sweden
[3] Univ Paris Saclay, Univ Paris Sud, CNRS, LPGP,UMR 8578, F-91405 Orsay, France
[4] Univ Iceland, Inst Sci, Dunhaga 3, IS-107 Reykjavik, Iceland
基金
瑞典研究理事会;
关键词
magnetron sputtering; Ohmic heating; energy balance; DISCHARGE;
D O I
10.1088/0963-0252/25/6/065024
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The secondary electron emission yield gamma(SE) is identified as the key parameter determining the relative importance of the two processes. For a conventional 5 cm diameter planar dc magnetron, Ohmic heating is found to be more important than sheath energization for secondary electron emission yields below around 0.1.
引用
收藏
页数:6
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