2D Materials for Universal Thermal Imaging of Micro- and Nanodevices: An Application to Gallium Oxide Electronics

被引:23
作者
Lundh, James Spencer [1 ]
Zhang, Tianyi [2 ]
Zhang, Yuewei [3 ]
Xia, Zhanbo [3 ]
Wetherington, Maxwell [2 ]
Lei, Yu [4 ,5 ]
Kahn, Ethan [2 ]
Rajan, Siddharth [3 ]
Terrones, Mauricio [4 ,5 ]
Choi, Sukwon [1 ]
机构
[1] Penn State Univ, Dept Mech Engn, University Pk, PA 16802 USA
[2] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
[3] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[4] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
[5] Penn State Univ, Dept Chem, University Pk, PA 16802 USA
关键词
2D materials; Raman spectroscopy; thermal imaging; micro/nanodevices; 2DRT; MoS2; beta-Ga2O3; 2-DIMENSIONAL MATERIALS; ALGAN/GAN HEMTS; MOS2; RAMAN; TEMPERATURE; CONDUCTIVITY; TRANSISTORS; GRAPHENE; SEMICONDUCTOR; THERMOGRAPHY;
D O I
10.1021/acsaelm.0c00574
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We highlight the flexibility of two-dimensional (2D) materials for advancing current technologies through the introduction of 2D Raman thermography (2DRT). 2DRT combines monolayer materials and Raman spectroscopy to perform thermal imaging of micro- and nanodevices. In contrast to peak shift and line width based methods for Raman thermal analysis, 2DRT uses the anti-Stokes/Stokes intensity ratio which is only sensitive to temperature. To demonstrate the technique, monolayer molybdenum disulfide (MoS2) was transferred to the surface of devices based on beta-gallium oxide (Ga2O3), an emerging ultrawide-bandgap semiconductor for high-frequency and high-power applications. The validation of the technique was performed on an (AlGa)(2)O-3/Ga2O3 modulation-doped field effect transistor by using nanoparticle-assisted Raman thermometry. The peak operating temperature, a critical device performance metric, is underestimated by similar to 30% by using standard Raman thermometry when compared to 2DRT. Finally, the 2D thermal imaging capabilities of 2DRT were demonstrated on an (AlGa)(2)O-3/Ga2O3 transmission line measurement structure.
引用
收藏
页码:2945 / 2953
页数:9
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