Fabrication, Electrical and Dielectric Characterization of Au/CNT/TiO2/SiO2/p-Si/Al with High Dielectric Constant, Low Loss Dielectric Tangent

被引:13
|
作者
Ashery, A. [1 ]
Gad, S. A. [2 ]
Gaballah, A. E. H. [3 ]
Turky, G. M. [4 ]
机构
[1] Natl Res Ctr, Phys Res Div, Dept Solid State Phys, Solid State Elect Lab, Giza 12622, Egypt
[2] Natl Res Ctr, Div Phys, Dept Solid State Phys, POB 12622, Giza, Egypt
[3] Natl Inst Stand NIS, Photometry & Radiometry Div, Giza 12211, Egypt
[4] Natl Res Ctr, Div Phys, Microwave Phys & Dielect Dept, Giza 12622, Egypt
关键词
CURRENT-VOLTAGE CHARACTERISTICS; CARBON NANOTUBES; SCHOTTKY DIODES; NANOCOMPOSITES; GRAPHENE; PERFORMANCE; PARAMETERS; MECHANISMS;
D O I
10.1149/2162-8777/abfa2c
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The aim of the paper has always been to explore the possibility of constructing new electronics devices based on Au/CNT/TiO2/SiO2/p-Si/Al multi-layers structure highlighting the appearance of negative dielectric constant (epsilon ') and dielectric loss tangent (epsilon ') at low frequencies in the range 5000-10 Hz. We have investigated the structural, electrical, and dielectric properties of this structure using different techniques like SEM, XRD pattern, Raman spectroscopy, I-V, and C-V measurements. At various temperatures, frequencies, and voltages, we present a detailed analysis of the dielectric constant and dielectric loss tangent. The highest dielectric constant combined with the lowest dielectric loss tangent would improve the use of Au/CNT/TiO2/SiO2/p-Si/Al structures in various electronic applications such as diodes, energy storage, and supercapacitor devices. In this study, the maximum dielectric constant values were around 4000, with dielectric loss tangents ranging from 0.08 to 0.32 at high and mid-frequency ranging from (2 x 10(7) - 10(5) Hz). The Col-Col diagram of epsilon ' as a function of epsilon ' of Au/CNT/TiO2/SiO2/p-Si/Al was also investigated.
引用
收藏
页数:12
相关论文
共 50 条
  • [41] A novel strategy to improve the thermal stability of dielectric properties and reduce the dielectric loss tangent of Ca1-1.5xPrxCu3Ti4O12/TiO2 ceramics
    Swatsitang, Ekaphan
    Prompa, Krissana
    Putjuso, Thanin
    CERAMICS INTERNATIONAL, 2019, 45 (12) : 14733 - 14741
  • [42] Synthesis of calcium copper titanate (CaCu3Ti4O12) nanowires with insulating SiO2 barrier for low loss high dielectric constant nanocomposites
    Tang, Haixiong
    Zhou, Zhi
    Bowland, Christopher C.
    Sodano, Henry A.
    NANO ENERGY, 2015, 17 : 302 - 307
  • [43] Finely-reconciled high dielectric constant and low dielectric loss in ternary polymer/Cr2C3/montmorillonite composite films by filler-synergy strategy
    Deng, Qihuang
    Zhou, Junquan
    Li, Xianping
    Feng, Yefeng
    Liang, Yurun
    Liu, Qihang
    CURRENT APPLIED PHYSICS, 2021, 22 : 104 - 110
  • [44] Enhanced response speed of TiO2 nanoarrays based all solid-state ultraviolet photodetector via SiO2 dielectric layer
    Yang, Dongmei
    Ren, Yuxin
    Du, Fenqi
    Hu, Peng
    Jiao, Yang
    Teng, Feng
    Fan, Haibo
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 867
  • [45] Towards an optical switching of memory effect in Au/TiO2/ITO/ZnO:Al/p-Si heterostructure based on nanoparticles
    Nouiri, M.
    Djessas, K.
    El Mir, L.
    APPLIED NANOSCIENCE, 2018, 8 (08) : 2001 - 2007
  • [46] Low Temperature Fabrication of an Amorphous InGaZnO Thin-Film Transistor With a sol-gel SiO2 Gate Dielectric
    Hsu, Chih-Chieh
    Chu, Ming-Wei
    Sun, Jhen-Kai
    Chou, Hsueh-Tao
    JOURNAL OF DISPLAY TECHNOLOGY, 2016, 12 (10): : 1043 - 1050
  • [47] Breakdown phenomena of Al-based high-k dielectric/SiO2 stack on 4H-SiC
    Kumta, A.
    Rusli
    Xia, J. H.
    APPLIED PHYSICS LETTERS, 2009, 94 (23)
  • [48] Towards suppressing loss tangent: Effect of SiO2 coating layer on dielectric properties of core-shell structure flaky Cu reinforced PVDF composites
    Zhou, Wenying
    Xu, Li
    Jiang, Liyang
    Peng, Jiandong
    Gong, Ying
    Liu, Xiangrong
    Cai, Huiwu
    Wang, Guangheng
    Chen, Qingguo
    JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 710 : 47 - 56
  • [49] Investigation of Pulsed Laser Deposited Ni/TiO2/p-Si/Al Heterojunction using Impedance Spectroscopy at Low Temperatures
    Kumar, Ashwani
    SEMICONDUCTORS, 2025, 59 (03) : 266 - 273
  • [50] The effect of series resistance and oxide layer formed by thermal oxidation on some electrical parameters of Al/SiO2/p-Si Schottky diodes
    Dokme, Ilbilge
    PHYSICA B-CONDENSED MATTER, 2007, 388 (1-2) : 10 - 15