Radio frequency magnetron sputtering deposition of hetero-epitaxial strontium barium niobate thin films (SrxBa1-xNb2O6)

被引：29

作者：

Cuniot-Ponsard, M

Desvignes, JM

Ea-Kim, B

Leroy, E

机构：

[1] Ctr Univ Paris Sud, Ecole Super Opt, CNRS, Lab Charles Fabry,Inst Opt,UMR 8501, F-91403 Orsay, France

[2] CNRS, Lab Chim Met Terres Rrares, UPR 209, F-94320 Thiais, France

来源：

JOURNAL OF APPLIED PHYSICS | 2003年 / 93卷 / 03期

关键词：

D O I：

10.1063/1.1535749

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Excellent electro-optic properties of SrxBa1-xNb2O6 crystals (SBN:x) motivate the attempts to control the deposition of high ordered SBN thin films with the aim of optical waveguiding and processing integration. We have examined the ability of sputtering techniques to deposit stoichiometric SBN thin films. Composition analysis has enabled us to probe the mechanisms which control the target-film composition transfer and to define an experimental strategy for stoichiometry control. Epitaxial (001) SBN thin films have been obtained on MgO (100) substrates, which exhibit two in-plane orientations (+/-31degrees) mirror symmetric to the MgO cell axis. (C) 2003 American Institute of Physics. [DOI: 10.1063/1.1535749].

引用

页码：1718 / 1724

页数：7

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