N-Polar GaN Cap MISHEMT With Record Power Density Exceeding 6.5 W/mm at 94 GHz

被引:95
作者
Wienecke, Steven [1 ]
Romanczyk, Brian [1 ]
Guidry, Matthew [1 ]
Li, Haoran [1 ]
Ahmadi, Elaheh [1 ]
Hestroffer, Karine [1 ]
Zheng, Xun [1 ]
Keller, Stacia [1 ]
Mishra, Umesh K. [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
关键词
GaN; high-electron-mobility-transistor (HEMT); millimeter (mm) wave; N-Polar; power amplifier; W-band; ELECTRON-MOBILITY TRANSISTORS;
D O I
10.1109/LED.2017.2653192
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel N-Polar GaN cap (MIS) high electron mobility transistor demonstrating record 6.7-W/mm power density with an associated power-added efficiency of 14.4% at 94 GHz is presented. This state-of-the-art power performance is enabled by utilizing the inherent polarization fields of N-Polar GaN in combination with a 47.5-nm in situ GaN cap layer to simultaneously mitigate dispersion and improve access region conductivity. These excellent results build upon past work through the use of optimized device dimensions and a transition from a sapphire to a SiC substrate for reduced self-heating.
引用
收藏
页码:359 / 362
页数:4
相关论文
共 25 条
[1]   Model to explain the behavior of 2DEG mobility with respect to charge density in N-polar and Ga-polar AlGaN-GaN heterostructures [J].
Ahmadi, Elaheh ;
Keller, Stacia ;
Mishra, Umesh K. .
JOURNAL OF APPLIED PHYSICS, 2016, 120 (11)
[2]  
Brown DF, 2011, 2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)
[3]  
Grundmann M., BandEng
[4]  
Guidry M, 2016, IEEE MTT S INT MICR
[5]  
Guidry M, 2016, 2016 87TH ARFTG MICROWAVE MEASUREMENT CONFERENCE (ARFTG)
[6]   Properties of N-polar AlGaN/GaN heterostructures and field effect transistors grown by metalorganic chemical vapor deposition [J].
Keller, S. ;
Suh, C. S. ;
Chen, Z. ;
Chu, R. ;
Rajan, S. ;
Fichtenbaum, N. A. ;
Furukawa, M. ;
DenBaars, S. P. ;
Speck, J. S. ;
Mishra, U. K. .
JOURNAL OF APPLIED PHYSICS, 2008, 103 (03)
[7]  
KOOLEN MCAM, 1991, PROCEEDINGS OF THE 1991 BIPOLAR CIRCUITS AND TECHNOLOGY MEETING, P188, DOI 10.1109/BIPOL.1991.160985
[8]  
Makiyama K, 2015, 2015 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)
[9]   GaN Technology for E, W and G-band Applications [J].
Margomenos, A. ;
Kurdoghlian, A. ;
Micovic, M. ;
Shinohara, K. ;
Brown, D. F. ;
Corrion, A. L. ;
Moyer, H. P. ;
Burnham, S. ;
Regan, D. C. ;
Grabar, R. M. ;
McGuire, C. ;
Wetzel, M. D. ;
Bowen, R. ;
Chen, P. S. ;
Tai, H. Y. ;
Schmitz, A. ;
Fung, H. ;
Fung, A. ;
Chow, D. H. .
2014 IEEE COMPOUND SEMICONDUCTOR INTEGRATED CIRCUIT SYMPOSIUM (CSICS): INTEGRATED CIRCUITS IN GAAS, INP, SIGE, GAN AND OTHER COMPOUND SEMICONDUCTORS, 2014,
[10]   94-GHz Large-Signal Operation of AlInN/GaN High-Electron-Mobility Transistors on Silicon With Regrown Ohmic Contacts [J].
Marti, Diego ;
Tirelli, Stefano ;
Teppati, Valeria ;
Lugani, Lorenzo ;
Carlin, Jean-Francois ;
Malinverni, Marco ;
Grandjean, Nicolas ;
Bolognesi, C. R. .
IEEE ELECTRON DEVICE LETTERS, 2015, 36 (01) :17-19