High-mobility BaSnO3 grown by oxide molecular beam epitaxy

被引:178
作者
Raghavan, Santosh [1 ]
Schumann, Timo [1 ]
Kim, Honggyu [1 ]
Zhang, Jack Y. [1 ]
Cain, Tyler A. [1 ]
Stemmer, Susanne [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
来源
APL MATERIALS | 2016年 / 4卷 / 01期
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.4939657
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High-mobility perovskite BaSnO3 films are of significant interest as new wide bandgap semiconductors for power electronics, transparent conductors, and as high mobility channels for epitaxial integration with functional perovskites. Despite promising results for single crystals, high-mobility BaSnO3 films have been challenging to grow. Here, we demonstrate a modified oxide molecular beam epitaxy (MBE) approach, which supplies pre-oxidized SnOx. This technique addresses issues in the MBE of ternary stannates related to volatile SnO formation and enables growth of epitaxial, stoichiometric BaSnO3. We demonstrate room temperature electron mobilities of 150 cm(2) V-1 s(-1) in films grown on PrScO3. The results open up a wide range of opportunities for future electronic devices. (C) 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
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页数:5
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