Study on the Dielectric Constant and on the Degree of Amorphous Structure Induced in Fluorinated Amorphous Carbon Films by Using X-ray Diffraction

This work examined the bonding structure of organic materials with low dielectric constants. Fluorinated amorphous carbon films have received much attention because of their similarities to materials with low dielectric constants and because of their hardness, which is similar to that of sp(3) carbon structures. The degree of the amorphous structure can be calculated from the Fourier transform of the reduced intensity function by using the corresponding X-ray diffraction patterns. The degree of the amorphous structure is related to the electron density, with the electron density of the fluorinated amorphous carbon films being defined as the result of a nucleophilic reaction based on the C=C bond, for various flow rate ratios. The reaction between the electron-deficient substituent group and the highly electronegative atom leads to the sp(3) carbon structure generated by the weak boundary condition due to the high electronegativity of fluorine atoms.