Bulk defect formation under light soaking in seed-end n-type Czochralski silicon wafers - Effect on silicon heterojunction solar cells

被引:8
作者
Letty, Elenore [1 ,2 ,3 ]
Veirman, Jordi [1 ,2 ]
Favre, Wilfried [1 ,2 ]
Lemiti, Mustapha [3 ]
机构
[1] Univ Grenoble Alpes, INES, F-73375 Le Bourget Du Lac, France
[2] CEA, Dept Solar Technol, LITEN, F-73375 Le Bourget Du Lac, France
[3] Univ Lyon, CNRS, Lyon Inst Nanotechnol INL, UMR 5270,INSA Lyon, Villeurbanne, France
关键词
Czochralsld silicon; Metastable defect; Light soaking; Silicon heterojunction solar cells; RECOMBINATION; DONORS; DECAY;
D O I
10.1016/j.solmat.2017.03.019
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We report on a degradation of the electronic properties of uncompensated seed-end n-type (phosphorus-doped) Czochralski silicon wafers under light soaking. We unambiguously demonstrate that this degradation is related to the formation and/or activation of a bulk defect under illumination. We bring general information about its activation/formation (illumination intensities, spatial distribution) as well as deactivation features. We show that this defect can be permanently suppressed in a few seconds at high temperatures (850 degrees C). Conversely annealing at low temperature (200 degrees C) was found to lead only to a temporary deactivation, the defect being reactivated/reformed after subsequent illumination. As a consequence, this defect could be harmful to solar cell technologies processed at low temperature, such as amorphous/crystalline silicon heterojunction (SHJ). The impact of the defect on SHJ cells performances is experimentally assessed at device level. Eventually the possible nature of the defect is discussed in the light of all collected data.
引用
收藏
页码:147 / 156
页数:10
相关论文
共 39 条
  • [31] Tkachev V. D., 1984, SOV PHYS SEMICOND, V18
  • [32] Recombination activity associated with thermal donor generation in monocrystalline silicon and effect on the conversion efficiency of heterojunction solar cells
    Tomassini, M.
    Veirman, J.
    Varache, R.
    Letty, E.
    Dubois, S.
    Hu, Y.
    Nielsen, O.
    [J]. JOURNAL OF APPLIED PHYSICS, 2016, 119 (08)
  • [33] Quantitative copper measurement in oxidized p-type silicon wafers using microwave photoconductivity decay -: art. no. 032109
    Väinölä, H
    Saarnilehto, E
    Yli-Koski, M
    Haarahiltunen, A
    Sinkkonen, J
    Berenyi, G
    Pavelka, T
    [J]. APPLIED PHYSICS LETTERS, 2005, 87 (03)
  • [34] Veirman J., 2016, PHOTOVOLT INT, V33
  • [35] Influence of oxygen and nitrogen on point defect aggregation in silicon single crystals
    vonAmmon, W
    Dreier, P
    Hensel, W
    Lambert, U
    Koster, L
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 36 (1-3): : 33 - 41
  • [36] THERMAL DOUBLE DONORS IN SILICON
    WAGNER, P
    HAGE, J
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 49 (02): : 123 - 138
  • [37] Intrinsic defects in silicon
    Watkins, GD
    [J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2000, 3 (04) : 227 - 235
  • [38] AUGER RECOMBINATION IN SILICON AT LOW CARRIER DENSITIES
    YABLONOVITCH, E
    GMITTER, T
    [J]. APPLIED PHYSICS LETTERS, 1986, 49 (10) : 587 - 589
  • [39] Evidence for Vacancy-Related Recombination Active Defects in as-Grown N-Type Czochralski Silicon
    Zheng, P.
    Rougieux, F. E.
    Grant, N. E.
    Macdonald, D.
    [J]. IEEE JOURNAL OF PHOTOVOLTAICS, 2015, 5 (01): : 183 - 188