Mapping the potential within a nanoscale undoped GaAs region using a scanning electron microscope

被引:17
作者
Kaestner, B
Schönjahn, C
Humphreys, CJ
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England
[2] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
关键词
D O I
10.1063/1.1689755
中图分类号
O59 [应用物理学];
学科分类号
摘要
Semiconductor dopant profiling using secondary electron imaging in a scanning electron microscope has been developed in recent years. In this letter, we show that the mechanism behind it also allows mapping of the electric potential of undoped regions. By using an unbiased GaAs/AlGaAs heterostructure, this letter demonstrates the direct observation of the electrostatic potential variation inside a 90-nm-wide undoped GaAs channel surrounded by ionized dopants. The secondary electron emission intensities are compared with two-dimensional numerical solutions of the electric potential. (C) 2004 American Institute of Physics.
引用
收藏
页码:2109 / 2111
页数:3
相关论文
共 14 条
[1]   Two-dimensional p-n junction under equilibrium conditions [J].
Achoyan, AS ;
Yesayan, AÉ ;
Kazaryan, ÉM ;
Petrosyan, SG .
SEMICONDUCTORS, 2002, 36 (08) :903-907
[2]   Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging [J].
Castell, MR ;
Simpson, TW ;
Mitchell, IV ;
Perovic, DD ;
Baribeau, JM .
APPLIED PHYSICS LETTERS, 1999, 74 (16) :2304-2306
[3]   ELECTRON BEAM INDUCED POTENTIAL CONTRAST ON UNBIASED PLANAR TRANSISTORS [J].
CHANG, THP ;
NIXON, WC .
SOLID-STATE ELECTRONICS, 1967, 10 (07) :701-&
[4]   SIMPLE CALCULATION OF ENERGY-DISTRIBUTION OF LOW-ENERGY SECONDARY ELECTRONS EMITTED FROM METALS UNDER ELECTRON-BOMBARDMENT [J].
CHUNG, MS ;
EVERHART, TE .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (02) :707-709
[5]   Dopant profiling with the scanning electron microscope - A study of Si [J].
Elliott, SL ;
Broom, RF ;
Humphreys, CJ .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (11) :9116-9122
[6]  
Howie A, 2000, MICROSC MICROANAL, V6, P291
[7]   Lateral p-n junction in modulation doped AlGaAs/GaAs [J].
Kaestner, B ;
Hasko, DG ;
Williams, DA .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (4B) :2513-2515
[8]   Quasi-lateral 2DEG-2DHG junction in AlGaAs/GaAs [J].
Kaestner, B ;
Wunderlich, J ;
Hasko, DG ;
Williams, DA .
MICROELECTRONICS JOURNAL, 2003, 34 (5-8) :423-425
[9]  
Mil'shtein S, 2000, SCANNING, V22, P227, DOI 10.1002/sca.4950220401
[10]   FIELD-EMISSION SEM IMAGING OF COMPOSITIONAL AND DOPING LAYER SEMICONDUCTOR SUPERLATTICES [J].
PEROVIC, DD ;
CASTELL, MR ;
HOWIE, A ;
LAVOIE, C ;
TIEDJE, T ;
COLE, JSW .
ULTRAMICROSCOPY, 1995, 58 (01) :104-113