Misorientation defects in coalesced self-catalyzed GaN nanowires

被引:42
作者
Grossklaus, K. A. [1 ,2 ]
Banerjee, A. [1 ,3 ]
Jahangir, S. [1 ,3 ]
Bhattacharya, P. [1 ,3 ]
Millunchick, J. M. [1 ,2 ]
机构
[1] Univ Michigan, Ctr Photon & Multiscale Nanomat, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[3] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
Characterization; Molecular beam epitaxy; Nanomaterials; Semiconducting III-V materials; III-NITRIDE NANOCOLUMNS; GROWTH; NUCLEATION;
D O I
10.1016/j.jcrysgro.2013.02.019
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The coalescence of self-catalyzed GaN nanowires grown on Si substrates has been examined in order to identify the cause of coalescence and to characterize the defect structures resulting from it. Coalescence is found to occur due to both nanowire crystallographic misalignment and initial nanowire proximity independent of the growth conditions. Defects occasionally result from coalesced nanowires, and the root cause of defect creation is found to be crystallographic misorientation between the nanowires. Several different defect structures are identified, and the types of defects that may form are found to depend on the degree of that misorientation. In the most extreme cases "zipper"-like arrays of dislocations and stacking faults were observed. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:142 / 147
页数:6
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