Determination of Refractive Index and Thickness of Thin-Film from Reflectivity Spectrum Using Genetic Algorithm

被引：4
|
作者：
Patel, Sanjaykumar J. [1 ]
Kheraj, Vipul [1 ]
机构：
[1] SV Natl Inst Technol, Dept Appl Phys, Surat 395007, Gujarat, India
来源：
PROCEEDING OF INTERNATIONAL CONFERENCE ON RECENT TRENDS IN APPLIED PHYSICS & MATERIAL SCIENCE (RAM 2013) | 2013年 / 1536卷
关键词：
Thin-film; Genetic Algorithm; Reflectivity and LabVIEW etc; OPTICAL-CONSTANTS; SPECTROSCOPIC ELLIPSOMETRY; SILICON;
D O I：
10.1063/1.4810324
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The precise determination of refractive index (n) of material and thickness (t) of thin-films are desirable for many applications in the field of optics and optoelectronics. In the proposed work, we have utilized a computational genetic algorithm (GA) to find the refractive index and the thickness from the experimentally measured reflectivity spectra of thin-film. The algorithm was implemented using the LabVIEW as a programming tool. The obtained results show that the prepared algorithm successfully calculates the spectral dependence of refractive index and thickness of thin-films by fitting an experimentally measured reflectivity spectra with the calculated ones.
引用
收藏
页码：509 / 510
页数：2
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