共 49 条
[1]
Effect of film composition on the performance of interdigitated electrode methods used for chemically amplified photoresist characterization: Methods for analyzing photoresist materials containing base quencher
[J].
Advances in Resist Technology and Processing XXII, Pt 1 and 2,
2005, 5753
:1076-1087
[2]
Comparison of methods for acid quantification: Impact of resist components on acid generating efficiency
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2,
2000, 3999
:190-203
[3]
Additive chemistry and distributions in photoresist thin films
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2016, 34 (03)
[5]
De Bisschop P., 2019, P SOC PHOTO-OPT INS, V10957
[6]
De Silva A., 2018, P SOC PHOTO-OPT INS
[7]
De Silva A., 2019, P SPIE, V11147
[8]
De Silva A., 2017, P SOC PHOTO-OPT INS
[9]
De Silva A, 2018, J MICRONANOLITHOGR M, V18
[10]
De Silva A., 2020, P SPIE, V11323