Oxygen sensitivity of SrTiO3 thin film prepared using atomic layer deposition

被引：44

作者：

Hara, Toru ^{[1
]}

Ishiguro, Takashi ^{[1
]}

机构：

[1] Taiyo Yuden Co Ltd, Corp Technol Planning Dept, Res & Dev Lab, Gunma 3708522, Japan

来源：

SENSORS AND ACTUATORS B-CHEMICAL | 2009年 / 136卷 / 02期

关键词：

Gas sensor; SrTiO(3); Atomic layer deposition; POLARONS;

D O I：

10.1016/j.snb.2008.12.026

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

A strontium titanate (SrTiO(3)) thin Him showed high oxygen sensitivity oil the ppb order at room temperature. The sensitivity is enough to monitor oxygen contamination in semiconductor manufacturing processes, which is becoming increasingly important as semiconductor devices are scaled clown to the nanometer generation. The SrTiO(3) film was prepared using atomic layer deposition (ALD),which has been established and found suitable for mass production. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：489 / 493

页数：5

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