Pre-bond and Post-bond Testing of TSVs and Die-to-Die Interconnects

被引:2
|
作者
Huang, Shi-Yu [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu 30013, Taiwan
来源
2016 IEEE 25TH ASIAN TEST SYMPOSIUM (ATS) | 2016年
关键词
Through-Silicon Via; die-to-die interconnect; pre-bond testing; post-bond testing; interposer; 3D-IC;
D O I
10.1109/ATS.2016.67
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Chip-to-chip interconnects can be traditionally tested for stuck-at faults and hard bridging faults via the boundary scan test standard. However, such a traditional test method may not be adequate for 3D-ICs, in which die-to-die interconnects could operate at a very high speed with an end-to-end delay of only a few hundred of picoseconds. Parametric defects (such as small delay faults, resistive open/bridging faults, leakage faults, etc.) have been identified as new threats to the quality, yield, and reliability of a 3D-IC. In response to this challenge, numerous test methods have been developed. In this chapter, we will first discuss common defect types occurring to die-to-die interconnects, and then review various interconnect test methods applicable during the pre-bond stage and the post-bond stage.
引用
收藏
页码:80 / 85
页数:6
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