Analysis of I-V measurements on CrSi2-Si Schottky structures in a wide temperature range - Comment

被引:163
作者
Horvath, ZJ
机构
基金
匈牙利科学研究基金会;
关键词
D O I
10.1016/0038-1101(95)00148-M
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recently, the current-voltage (I-V) characteristics of CrSi2/(111) n-Si Schottky junctions measured in the temperature range of 90-350 K were analyzed by Barus and Donoval. They obtained temperature ideality factors and apparent barrier heights by using the pure thermionic emission (TE) theory. They presented a correct explanation of these features by taking into account some other possible current mechanisms, namely, the generation-recombination and the thermoionic-field emission (TFE). This paper proposes another alternative explanation of this behavior. It analyzes the temperature dependence of the ideality factor and apparent barrier height evaluated by TE theory for several Schottky junctions, and it concludes that it may often explained assuming the domination of current flow by TFE with anomalously high characteristic energies.
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页码:176 / 178
页数:3
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