1.3 μm InAs/GaAs quantum dots directly capped with GaAs grown by metal-organic chemical vapor deposition

被引:2
|
作者
Huang, KF
Hsieh, TP
Yeh, NT
Ho, WJ
Chyi, JI
Wu, MC [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[2] Natl Cent Univ, Dept Elect Engn, Chungli 320, Taiwan
[3] Chungha Telecom Co Ltd, Telecommun Labs, Yangmei 326, Taiwan
关键词
photoluminescence; metalorganic chemical vapor deposition; quantum dots;
D O I
10.1016/j.jcrysgro.2003.12.066
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, we investigate the effects of growth temperature and growth rate on the formation of InAs/GaAs quantum dots (QDs) grown by metalorganic chemical vapor deposition. These QDs are formed with large InAs coverage (3.0 MLs) and periodic growth interruption via the Stranski-Krastanow epitaxial growth mode. The photoluminescence (PL) spectra at 300 K exhibit a red shift in peak wavelength by decreasing the InAs growth temperature from 540degreesC to 500degreesC. As the growth rate increases from 0.05 to 0.2ML/s at a growth temperature of 500degreesC, the PL linewidth decreases and the PL intensity increases. These results are related to the In clusters and uniformity of InAs/GaAs QDs, which are observed by scanning electron microscopy (SEM). Finally, the room-temperature PL spectrum of InAs/GaAs QDs directly capped with GaAs layer shows an emission wavelength at 1.35 mum and a narrow linewidth of 30.8 meV. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:128 / 133
页数:6
相关论文
共 50 条
  • [41] Photoluminescence study of InAs quantum dots and quantum dashes grown on GaAs (211)B
    Guo, SP
    Ohno, H
    Shen, AD
    Ohno, Y
    Matsukura, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (3B): : 1527 - 1531
  • [42] Growth of InAs Quantum Dots on Germanium Substrate Using Metal Organic Chemical Vapor Deposition Technique
    Tanuj Dhawan
    Renu Tyagi
    RajeshKumar Bag
    Mahavir Singh
    Premila Mohan
    T Haldar
    R Murlidharan
    RP Tandon
    Nanoscale Research Letters, 5
  • [43] Growth of InAs Quantum Dots on Germanium Substrate Using Metal Organic Chemical Vapor Deposition Technique
    Dhawan, Tanuj
    Tyagi, Renu
    Bag, Rajesh Kumar
    Singh, Mahavir
    Mohan, Premila
    Haldar, T.
    Murlidharan, R.
    Tandon, R. P.
    NANOSCALE RESEARCH LETTERS, 2010, 5 (01): : 31 - 37
  • [44] Dislocation analysis of InGaN/GaN quantum dots grown by metal organic chemical vapor deposition
    Yang, Di
    Wang, Lai
    Hao, Zhi-Biao
    Luo, Yi
    Sun, Changzheng
    Han, Yanjun
    Xiong, Bing
    Wang, Jian
    Li, Hongtao
    SUPERLATTICES AND MICROSTRUCTURES, 2016, 99 : 221 - 225
  • [45] Parameters influencing interfacial morphology in GaAs/Ge superlattices grown by metal organic chemical vapor deposition
    Jia, Roger
    Fitzgerald, Eugene A.
    JOURNAL OF CRYSTAL GROWTH, 2016, 435 : 50 - 55
  • [46] Stacked GaAs(Sb)(N)-capped InAs/GaAs quantum dots for enhanced solar cell efficiency
    Utrilla, Antonio D.
    Ulloa, Jose M.
    Gacevic, Zarko
    Reyes, Daniel F.
    Gonzalez, David
    Ben, Teresa
    Guzman, Alvaro
    Hierro, Adrian
    PHYSICS SIMULATION AND PHOTONIC ENGINEERING OF PHOTOVOLTAIC DEVICES IV, 2015, 9358
  • [47] Optical characterisation of MOVPE grown vertically correlated InAs/GaAs quantum dots
    Hazdra, P.
    Voves, J.
    Oswald, J.
    Kuldova, K.
    Hospodkova, A.
    Hulicius, E.
    Pangrac, J.
    MICROELECTRONICS JOURNAL, 2008, 39 (08) : 1070 - 1074
  • [48] Optimizing the GaAs capping layer growth of 1.3 μm InAs/GaAs quantum dots by a combined two-temperature and annealing process at low temperatures
    Yang, Tao
    Nishioka, Masao
    Arakawa, Yasuhiko
    JOURNAL OF CRYSTAL GROWTH, 2008, 310 (24) : 5469 - 5472
  • [49] Photoluminescence of GaAlAs/GaAs quantum wells grown by metalorganic chemical vapor deposition
    Song, XW
    Qu, Y
    Li, M
    Gao, X
    Li, XQ
    Zhang, XD
    ELECTRO-OPTIC AND SECOND HARMONIC GENERATION MATERIALS, DEVICES, AND APPLICATIONS II, 1998, 3556 : 170 - 172
  • [50] A method to obtain ground state electroluminescence from 1.3 μm emitting InAs/GaAs quantum dots grown by molecular beam epitaxy
    Kong, YC
    Zhou, DY
    Lan, Q
    Liu, JL
    Miao, ZH
    Feng, SL
    Niu, ZC
    CHINESE PHYSICS, 2003, 12 (01): : 97 - 99