High-efficiency InAs/GaAs quantum dot solar cells by metalorganic chemical vapor deposition

被引:76
作者
Tanabe, Katsuaki [1 ]
Guimard, Denis [1 ,2 ]
Bordel, Damien [1 ]
Arakawa, Yasuhiko [1 ,2 ]
机构
[1] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
[2] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
基金
日本学术振兴会;
关键词
GAAS; CHARGE;
D O I
10.1063/1.4714767
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricate a high-efficiency InAs/GaAs quantum dot (QD) solar cell. It contains five layers of high-density self-assembled InAs QDs grown by metalorganic chemical vapor deposition suppressing open-circuit-voltage (V-OC) degradation. We develop a dual-layer anti-reflection coating of optimum thicknesses. The resulting cell exhibits efficiencies of 18.7% under AM1.5G for 1 sun and 19.4% for 2 suns. Concentrator measurements demonstrate the advantage of QD use under concentrated illumination, owing to the significant increase in V-OC. We also find a V-OC offset of 0.3 V from the QD ground-state transition energies for QD cells, in contrast to 0.4 V for state-of-the-art bulk semiconductor cells. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4714767]
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页数:3
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