Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

被引：13
|
作者：
Park, KC [1 ]
Moon, JH [1 ]
Chung, SJ [1 ]
Oh, MH [1 ]
Milne, WI [1 ]
Jang, J [1 ]
机构：
[1] KYUNG HEE UNIV,DEPT PHYS,SEOUL 130701,SOUTH KOREA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 02期
关键词：
D O I：
10.1116/1.589331
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We deposited diamondlike carbon (DLC) films of various hydrogen contents by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF4 plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF4 plasma exposure time. The emission current increases and turn-on held decreases with decreasing hydrogen content in the DLC film. (C) 1997 American Vacuum Society.
引用
收藏
页码：428 / 430
页数：3
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