Response to "Comment on 'Comparative analysis of glass-formation in binary, ternary, and multicomponent alloys'" [J. Appl. Phys. 114, 166101 (2013)]

被引：1

作者：

Louzguine-Luzgin, Dmitri V. ^{[1
]}

Miracle, Daniel B. ^{[2
]}

Louzguina-Luzgina, Larissa ^{[1
]}

Inoue, Akihisa ^{[1
]}

机构：

[1] Tohoku Univ, WPI Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan

[2] Air Force Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2013年 / 114卷 / 16期

关键词：

METALLIC GLASSES;

D O I：

10.1063/1.4826620

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页数：2

共 50 条

[1] Response to Comment on 'Comparative analysis of glass-formation in binary, ternary, and multicomponent alloys' [J. Appl. Phys. 114, 166101 (2013)]
1600, American Institute of Physics, 2 Huntington Quadrangle, Suite N101, Melville, NY 11747-4502, United States (114):
[2] Comment on "Comparative analysis of glass-formation in binary, ternary, and multicomponent alloys" [J. Appl. Phys. 108, 103511 (2010)]
Luo, L. J.
Dong, C.
JOURNAL OF APPLIED PHYSICS, 2013, 114 (16)
[3] Comment on comparative analysis of glass-formation in binary, ternary, and multicomponent alloys [J. Appl. Phys. 108, 103511 (2010)]
Dong, C. (dong@dlut.edu.cn), 1600, American Institute of Physics Inc. (114):
[4] Comparative analysis of glass-formation in binary, ternary, and multicomponent alloys
Louzguine-Luzgin, Dmitri V.
Miracle, Daniel B.
Louzguina-Luzgina, Larissa
Inoue, Akihisa
JOURNAL OF APPLIED PHYSICS, 2010, 108 (10)
[5] Response to Comment on A model for internal photoemission at high-k oxide/silicon energy barriers' [J. Appl. Phys. 113, 166101 (2013)]
Engström, O., 1600, American Institute of Physics, 2 Huntington Quadrangle, Suite N101, Melville, NY 11747-4502, United States (113):
[6] Response to "Comment on 'A model for internal photoemission at high-k oxide/silicon energy barriers'" [J. Appl. Phys. 113, 166101 (2013)]
Engstrom, Olof
JOURNAL OF APPLIED PHYSICS, 2013, 113 (16)
[7] Response to "Comment on 'Effective thermal conductivity in thermoelectric materials'" [J. Appl. Phys. 113, 204904 (2013)]
Baranowski, Lauryn L.
Snyder, G. Jeffrey
Toberer, Eric S.
JOURNAL OF APPLIED PHYSICS, 2014, 115 (12)
[8] Response to "Comment on 'Laser ablation of Cu and plume expansion into 1 atm ambient gas'" [J. Appl. Phys. 115, 166101 (2014)]
Chen, Zhaoyang
Bogaerts, Annemie
JOURNAL OF APPLIED PHYSICS, 2014, 115 (16)
[9] Erratum: Study of defect-induced ferromagnetism in hydrogenated anatase TiO2:Co' [J. Appl. Phys. 107, 113916 (2010)] (J. Appl. Phys. (2013) 114 (129902))
1600, American Institute of Physics Inc. (116):
[10] Comment on "An ultrathin and broadband metamaterial absorber using multi-layer structures" [J. Appl. Phys. 114, 064109 (2013)]
Wahidi, M. S.
Meraj-E-Mustafa
Tahir, Farooq A.
JOURNAL OF APPLIED PHYSICS, 2019, 125 (16)

← 1 2 3 4 5 →