Source prevention of halogenated antibiotic resistance genes proliferation: UV/sulfite advanced reduction process achieved accurate and efficient elimination of florfenicol antibacterial activity

被引:5
作者
Ding, Yangcheng [1 ,4 ,5 ]
Han, Jinglong [2 ]
Feng, Huajun [1 ]
Liang, Yuxiang [1 ]
Jiang, Wenli [3 ]
Liu, Shuhao [4 ]
Liang, Bin [2 ]
Wang, Meizhen [1 ,5 ]
Li, Zhiling [6 ]
Wang, Aijie [2 ,4 ]
Ren, Nanqi [2 ]
机构
[1] Zhejiang Gongshang Univ, Sch Environm Sci & Engn, Hangzhou 310018, Peoples R China
[2] Harbin Inst Technol Shenzhen, Sch Civil & Environm Engn, State Key Lab Urban Water Resource & Environm, Shenzhen 518055, Peoples R China
[3] Univ Calif Berkeley, Dept Civil & Environm Engn, Berkeley, CA 94720 USA
[4] Chinese Acad Sci, Res Ctr Ecoenvironm Sci, Key Lab Environm Biotechnol, Beijing 100085, Peoples R China
[5] Zhejiang Gongshang Univ, Sch Stat & Math, Hangzhou 310018, Peoples R China
[6] Harbin Inst Technol, Sch Environm, State Key Lab Urban Water Resource & Environm, Harbin 150090, Peoples R China
基金
中国国家自然科学基金;
关键词
UV; sulfite; Advanced reduction process; Florfenicol antibiotic; Antibacterial activity; Antibiotic resistance genes; WASTE-WATER TREATMENT; HYDRATED ELECTRON; BY-PRODUCTS; DEGRADATION; UV/H2O2; UV; CHLORAMPHENICOL; REMOVAL; PHOTODEGRADATION; DECHLORINATION;
D O I
10.1016/j.scitotenv.2022.157844
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The production and consumption of halogenated antibiotics, such as florfenicol (FLO), remain high, accompanied by a large amount of antibiotic-containing wastewater, which would induce the potential proliferation and transmission of antibiotic resistance genes (ARGs) in conventional biological systems. This study revealed that the introduction of reductive species (mainly H center dot) by adding sulfite during UV irradiation process accelerated the decomposition rate of FLO, increasing from 0.1379 min-1 in the single UV photolytic system to 0.3375 min-1 in the UV/sulfite system. The enhanced photodecomposition in UV/sulfite system was attributed to the improved dehalogenation performance and additional removal of sulfomethyl group at the site of the benzene ring, which were the representative structures consisting of FLO antibacterial activity. Compared with single UV photolysis, UV/sulfite advanced reduction process saved the light energy requirement by 40 % for the evolutionary suppression of floR, and its corresponding class of ARGs in subsequent biotreatment system was controlled at the level of the negative group. Compared with UV/ H2O2 and UV/persulfate systems, the decomposition rate of FLO in the UV/S system was the highest and preserved the corresponding carbon source of the coexisting organic compounds for the potential utilization of microbial metab-olism in subsequent biotreatment process. These results demonstrated that UV/sulfite advanced reduction process could be adopted as a promising pretreatment option for the source prevention of representative ARGs proliferation of halogenated antibiotics in subsequent biotreatment process.
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页数:9
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