Weak localization and weak antilocalization in doped germanium epilayers

被引:23
作者
Newton, P. J. [1 ]
Mansell, R. [1 ]
Holmes, S. N. [2 ]
Myronov, M. [3 ]
Barnes, C. H. W. [1 ]
机构
[1] Univ Cambridge, Cavendish Lab, Dept Phys, JJ Thomson Ave, Cambridge CB3 0HE, England
[2] Toshiba Res Europe Ltd, Cambridge Res Lab, 208 Cambridge Sci Pk,Milton Rd, Cambridge CB4 0GZ, England
[3] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
基金
英国工程与自然科学研究理事会;
关键词
MAGNETORESISTANCE;
D O I
10.1063/1.4975600
中图分类号
O59 [应用物理学];
学科分类号
摘要
The magnetoresistance of 50 nm thick epilayers of doped germanium is measured at a range of temperatures down to 1.6 K. Both n- and p-type devices show quantum corrections to the conductivity in an applied magnetic field, with n-type devices displaying weak localization and p-type devices showing weak antilocalization. From fits to these data using the Hikami-Larkin-Nagaoka model, the phase coherence length of each device is extracted, as well as the spin diffusion length of the p-type device. We obtain phase coherence lengths as large as 325 nm in the highly doped n-type device, presenting possible applications in quantum technologies. The decay of the phase coherence length with temperature is found to obey the same power law of 1(phi) proportional to T-c, where c = -0.68 +/- 0.03, for each device, in spite of the clear differences in the nature of the conduction. In the p-type device, the measured spin diffusion length does not change over the range of temperatures for which weak antilocalization can be observed. The presence of a spin-orbit interaction manifested as weak antilocalization in the p-type epilayer suggests that these structures could be developed for use in spintronic devices such as the spin-FET, where significant spin lifetimes would be important for efficient device operation. Published by AIP Publishing.
引用
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页数:5
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