We report results on the effect of strain on the thermopower and electrical resistance of glass-coated individual Bi nanowires. Here, we show that there is a critical diameter of wires below which the contribution of holes to the charge transport in pure Bi nanowires is more significant than that of electrons. The properties of Bi nanowires are examined in the light of a strain induced electronic topological transition. At low temperatures, the thermopower dependences on strain exhibit a non-monotonic behavior inherent in thinner wires, where the thermopower is dominated by the diffusion transport mechanism of holes. The hole-dominated transport can be transformed into electron-dominated transport through a smooth manipulation with the phonon spectrum and Fermi surface by applying a uniaxial strain. A fairly high value of the thermoelectric power factor (S-2/rho = 89 mu W cm(-1) K-2) was found in the temperature range of 80-300 K, where the dominant mechanism contributing to the thermopower is diffusive thermoelectric generation with electrons as the majority carrier.
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Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
Moon, Hongjae
Kim, Jeongmin
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Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
Kim, Jeongmin
Chun, Dong Won
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Korea Inst Sci & Technol, Adv Anal Ctr, Hwarang Ro 14 Gil, Seoul 02792, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
Chun, Dong Won
Hong, Seokkyoon
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Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
Hong, Seokkyoon
Yoon, Young Soo
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Gachon Univ, Dept Mat Sci & Engn, Seongnam Si 13120, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
Yoon, Young Soo
Lee, Wooyoung
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Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea
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Columbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USAColumbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
Zuev, Yuri M.
Lee, Jin Seok
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Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA
Harvard Univ, Dept Phys, Cambridge, MA 02138 USAColumbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
Lee, Jin Seok
Galloy, Clement
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Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
Galloy, Clement
Park, Hongkun
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Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA
Harvard Univ, Dept Phys, Cambridge, MA 02138 USAColumbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
Park, Hongkun
Kim, Philip
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Columbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
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Howard Univ, Washington, DC 20059 USAHoward Univ, Washington, DC 20059 USA
Huber, T. E.
Nikolaeva, A.
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ASM, Inst Elect Engn & Ind Technol, MD-2028 Kishinev, Moldova
Int High Magnet Field & Low Temp Lab, PL-53421 Wroclaw, PolandHoward Univ, Washington, DC 20059 USA
Nikolaeva, A.
Gitsu, D.
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ASM, Inst Elect Engn & Ind Technol, MD-2028 Kishinev, MoldovaHoward Univ, Washington, DC 20059 USA
Gitsu, D.
Konopko, L.
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ASM, Inst Elect Engn & Ind Technol, MD-2028 Kishinev, Moldova
Int High Magnet Field & Low Temp Lab, PL-53421 Wroclaw, PolandHoward Univ, Washington, DC 20059 USA
Konopko, L.
Graf, M. J.
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Boston Coll, Dept Phys, Chestnut Hill, MA 02467 USAHoward Univ, Washington, DC 20059 USA