On the electrical behavior of V2O5/4H-SiC Schottky diodes

被引:20
作者
Bellone, S. [1 ]
Di Benedetto, L. [1 ]
Rubino, A. [1 ]
机构
[1] Univ Salerno, Dept Ind Engn, I-84084 Salerno, Italy
关键词
METAL-OXIDES; CONTACTS; LAYER; INHOMOGENEITIES;
D O I
10.1063/1.4809543
中图分类号
O59 [应用物理学];
学科分类号
摘要
A complete analysis of the rectifying behavior of V2O5/4H-SiC (divanadium pentoxide/4H polytype of silicon carbide) junction is reported. The analysis of forward and reverse J(D)-V-D curves of samples fabricated with 5 nm-thick V2O5 films shows that the carrier transport across junction is dominated by the field enhanced thermionic emission mechanism. All the physical and electrical parameters, such as Schottky barrier height, ideality factor, and series resistance, have been evaluated from temperature behavior of J(D)-V-D curves in the range 100-425 K and from C-D-V-D measurements. It is shown that the barrier height extracted from measurements can be justified in terms of inhomogeneities localized at the interface. (C) 2013 AIP Publishing LLC.
引用
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页数:6
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