Influence of Microwave Probes on Calibrated On-Wafer Measurements

被引:34
|
作者
Gia Ngoc Phung [1 ]
Schmuekle, Franz Josef [1 ]
Doerner, Ralf [1 ]
Kaehne, Bernhard [1 ]
Fritzsch, Thomas [2 ]
Arz, Uwe [3 ]
Heinrich, Wolfgang [1 ]
机构
[1] Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany
[2] Fraunhofer Inst Zuverlassigkeit & Mikrointegrat I, D-13355 Berlin, Germany
[3] PTB, Working Grp Fundamentals Scattering Parameter Mea, D-38116 Braunschweig, Germany
关键词
Calibration; coplanar waveguide (CPW); electromagnetic field simulation; multiline-thru-reflect-line (mTRL); on-wafer probing; probes;
D O I
10.1109/TMTT.2019.2903400
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
On-wafer probing with ground signal ground (GSG) probes contributes a variety of side effects, which are related to the measured line type, the carrier material, the layout with the neighboring structures, and the probe. Thus, the size and shape of the probe together with the measured line type and the neighboring circuits influence the quality of the calibrated measured result. This paper presents corresponding results when using the multiline-thru-reflect-line (mTRL) calibration, which is commonly accepted as one of the most accurate calibration algorithms, and concentrates on the impact of the probe construction together with neighboring elements, for the most common planar transmission lines, coplanar waveguides (CPWs), and thin-film microstrip lines (TFMSLs). For the first time, design guidelines with regard to the layout, the measurement environment, and the construction of the probes are given.
引用
收藏
页码:1892 / 1900
页数:9
相关论文
共 50 条
  • [31] MILLIMETER-WAVE ON-WAFER WAVE-FORM AND NETWORK MEASUREMENTS USING ACTIVE PROBES
    YU, RY
    REDDY, M
    PUSL, J
    ALLEN, ST
    CASE, M
    RODWELL, MJW
    IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1995, 43 (04) : 721 - 729
  • [32] On overtravel and skate in cantilever-based probes for on-wafer measurements (vol 32, 057001, 2022)
    Arscott, Steve
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2023, 33 (09)
  • [33] PRECISE DETERMINATION OF OPEN CIRCUIT CAPACITANCE OF COPLANAR PROBES FOR ON-WAFER AUTOMATIC NETWORK ANALYZER MEASUREMENTS
    CROZAT, P
    HENAUX, JC
    VERNET, G
    ELECTRONICS LETTERS, 1991, 27 (16) : 1476 - 1478
  • [34] On-Wafer Probe Station for Microwave Metrology at the Nanoscale
    El Fellahi, A.
    Haddadi, K.
    Marzouk, J.
    Arscott, S.
    Boyaval, C.
    Lasri, T.
    Dambrine, G.
    2015 IEEE INTERNATIONAL INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE (I2MTC), 2015, : 1960 - 1964
  • [35] REPEATABILITY AND VERIFICATION OF ON-WAFER NOISE PARAMETER MEASUREMENTS
    FRASER, A
    STRID, E
    LEAKE, B
    BURCHAM, T
    MICROWAVE JOURNAL, 1988, 31 (11) : 172 - 176
  • [36] Vector corrected on-wafer measurements of noise temperature
    Weatherspoon, MH
    Dunleavy, LP
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2005, 54 (03) : 1327 - 1332
  • [37] VNA Eases On-Wafer Measurements To 110 GHz
    Browne, Jack
    MICROWAVES & RF, 2011, 50 (09) : 98 - 100
  • [38] TRACEABILITY FOR ON-WAFER S-PARAMETER MEASUREMENTS
    BANNISTER, DJ
    PERKINS, M
    IEE PROCEEDINGS-A-SCIENCE MEASUREMENT AND TECHNOLOGY, 1992, 139 (05): : 232 - 234
  • [39] Repeatability and verification of on-wafer noise parameter measurements
    Fraser, Arthur
    Strid, Eric
    Leake, Bernie
    Burcham, Terry
    Microwave journal, 1988, 31 (11):
  • [40] Micromachined Probes for Submillimeter-Wave On-Wafer Measurements-Part II: RF Design and Characterization
    Reck, Theodore J.
    Chen, Lihan
    Zhang, Chunhu
    Arsenovic, Alex
    Groppi, Christopher
    Lichtenberger, Arthur
    Weikle, Robert M., II
    Barker, N. Scott
    IEEE TRANSACTIONS ON TERAHERTZ SCIENCE AND TECHNOLOGY, 2011, 1 (02) : 357 - 363