Dendrimers bearing hydroxyl groups supported by layered double hydroxides (CO3-LDH) with Mg/Al ratio ranging from 1:1 to 5:1 showed improved properties for the reversible capture of carbon dioxide (CO2). The adsorption capacity of the starting LDH was due to the intrinsic base-like behavior, and was found to depend on the Mg/Al ratio. When contacted with polyol dendrimers in aqueous media, no intercalation took place. This was explained in terms of low exfoliation grade of LDH and hydrophobic character of the dendrimer molecules. The latter rather adsorb on the external surface of the LDH stacks for low dendrimer loadings, or aggregate into organic clusters for higher contents. Analyses through thermal programmed desorption of CO2 revealed that dendrimer incorporation advantageously attenuates the basicity strength of the starting LDH support, by lowering the desorption temperature. The OH groups of the organic moiety were found to display an amphoteric character, and act as the main adsorption sites. The weak interactions with CO2 facilitate easier release of the major part of adsorbed CO2 at temperature not exceeding 80-100 A degrees C. On polyol organo-LDHs, the reversible CO2 retention was discussed herein in terms of acid-base interactions. This concept allows envisaging the capture of diverse pollutants and other greenhouse gases by modifying the chemical groups on the dendritic moiety.
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Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Chen, Chao
;
Yang, Seung-Tae
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Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Yang, Seung-Tae
;
Ahn, Wha-Seung
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Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Ahn, Wha-Seung
;
Ryoo, Ryong
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Korea Adv Inst Sci & Technol, Dept Chem, Ctr Funct Nanomat, Taejon 305701, South Korea
Korea Adv Inst Sci & Technol, Grad Sch Nanosci & Technol WCU, Taejon 305701, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
机构:
Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Chen, Chao
;
Yang, Seung-Tae
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机构:
Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Yang, Seung-Tae
;
Ahn, Wha-Seung
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Inha Univ, Dept Chem Engn, Inchon 402751, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea
Ahn, Wha-Seung
;
Ryoo, Ryong
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机构:
Korea Adv Inst Sci & Technol, Dept Chem, Ctr Funct Nanomat, Taejon 305701, South Korea
Korea Adv Inst Sci & Technol, Grad Sch Nanosci & Technol WCU, Taejon 305701, South KoreaInha Univ, Dept Chem Engn, Inchon 402751, South Korea