Magnetic and structural properties of Co ion-implanted GaN

被引:8
作者
Kim, W [1 ]
Kang, HJ
Oh, SK
Shin, S
Lee, JH
Song, J
Noh, SK
Oh, SJ
Kim, CS
机构
[1] Chungbuk Natl Univ, Dept Phys, Chonju 361763, South Korea
[2] Chungbuk Natl Univ, Inst Basic Sci Res, Chonju 361763, South Korea
[3] Korea Inst Sci & Technol, Seoul 130650, South Korea
[4] Korea Res Inst Stand & Sci, Seoul 305600, South Korea
[5] Korea Basic Sci Inst, Taejon 305333, South Korea
[6] Kookmin Univ, Dept Phys, Seoul 136702, South Korea
关键词
ion implantation; magnetic semiconductor;
D O I
10.1109/TNANO.2006.869652
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A GaN epilayer was grown on Al2O3 substrate by metal-organic chemical vapor deposition, and Co- ions with a dose of 3 x 10(16) cm(-2) were implanted into GaN at 350 degrees C. The implanted samples were postannealed at 700 degrees C-900 degrees C to recrystallize the samples and to remove implantation damage. We have investigated the magnetic and structural properties of Co ion-implanted GaN by using X-ray diffraction (XRD), superconducting quantum interference device (SQUID) magnetometer, and X-ray photoelectron spectroscopy (XPS). XRD results did not show any peaks associated with the second phase formation, and only the diffraction from the GaN layer and substrate structure were observed. The temperature dependence of magnetization taken,in zero-field-cooling and field-cooling conditions showed the features of superparamagnetic system in films annealed at 700 degrees C-900 degrees C. The magnetization curves at 5 K for samples annealed at 700 degrees C-900 degrees C exhibits ferromagnetic hysteresis loops, and the highest residual magnetization (M-R) and coercivity (H-c) of M-R = 1.5 X 10(-4) emu/g and H-c = 107 Oe were found in the 800 degrees C annealed sample. XPS measurement showed the metallic Co 2p core levels and the metallic valence band spectra for as-implanted and 700 degrees C-900 degrees C annealed samples. From these, it could be explained that the magnetic property of our films originated from Co and CoGa magnetic clusters.
引用
收藏
页码:149 / 151
页数:3
相关论文
共 18 条
  • [1] Semiconductor spintronics
    Akinaga, H
    Ohno, H
    [J]. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2002, 1 (01) : 19 - 31
  • [2] Effect of microstructural change on magnetic property of Mn-implanted p-type GaN
    Baik, JM
    Jang, HW
    Kim, JK
    Lee, JL
    [J]. APPLIED PHYSICS LETTERS, 2003, 82 (04) : 583 - 585
  • [3] Zener model description of ferromagnetism in zinc-blende magnetic semiconductors
    Dietl, T
    Ohno, H
    Matsukura, F
    Cibert, J
    Ferrand, D
    [J]. SCIENCE, 2000, 287 (5455) : 1019 - 1022
  • [4] Mining for high Tc ferromagnetism in ion-implanted dilute magnetic semiconductors
    Hebard, AF
    Rairigh, RP
    Kelly, JG
    Pearton, SJ
    Abernathy, CR
    Chu, SNG
    Wilson, RG
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (04) : 511 - 517
  • [5] Superparamagnetism in Co-ion-implanted anatase TiO2 thin films and effects of postannealing
    Kim, DH
    Yang, JS
    Kim, YS
    Kim, DW
    Noh, TW
    Bu, SD
    Kim, YW
    Park, YD
    Pearton, SJ
    Jo, Y
    Park, JG
    [J]. APPLIED PHYSICS LETTERS, 2003, 83 (22) : 4574 - 4576
  • [6] Comment on "Ferromagnetism in Cr-doped Ge"
    Kioseoglou, G
    Hanbicki, AT
    Jonker, BT
    [J]. APPLIED PHYSICS LETTERS, 2003, 83 (13) : 2716 - 2717
  • [7] Magnetic and structural properties of Co, Cr, V ion-implanted GaN
    Lee, JS
    Lim, JD
    Khim, ZG
    Park, YD
    Pearton, SJ
    Chu, SNG
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (08) : 4512 - 4516
  • [8] Transport properties and origin of ferromagnetism in (Ga,Mn)As
    Matsukura, F
    Ohno, H
    Shen, A
    Sugawara, Y
    [J]. PHYSICAL REVIEW B, 1998, 57 (04) : R2037 - R2040
  • [9] Room-temperature ferromagnetism in transparent transition metal-doped titanium dioxide
    Matsumoto, Y
    Murakami, M
    Shono, T
    Hasegawa, T
    Fukumura, T
    Kawasaki, M
    Ahmet, P
    Chikyow, T
    Koshihara, S
    Koinuma, H
    [J]. SCIENCE, 2001, 291 (5505) : 854 - 856
  • [10] Moulder J.F., 1995, HDB XRAY PHOTOELECTR