Cuprous oxide thin films grown by hydrothermal electrochemical deposition technique

被引：16

作者：

Majumder, M. ^{[1
]}

Biswas, I. ^{[1
]}

Pujaru, S. ^{[1
]}

Chakraborty, A. K. ^{[1
]}

机构：

[1] CSIR, Cent Glass & Ceram Res Inst, Kolkata 700032, India

来源：

THIN SOLID FILMS | 2015年 / 589卷

关键词：

Cuprous oxide; Electrochemical deposition; Hydrothermal electrochemical deposition; Active solar cell material; OXIDATION; CHEMISTRY;

D O I：

10.1016/j.tsf.2015.07.002

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Semiconducting cuprous oxide films were grown by a hydrothermal electro-deposition technique on metal (Cu) and glass (ITO) substrates between 60 degrees C and 100 degrees C. X-ray diffraction studies reveal the formation of cubic cuprous oxide films in different preferred orientations depending upon the deposition technique used. Film growth, uniformity, grain size, optical band gap and photoelectrochemical response were found to improve in the hydrothermal electrochemical deposition technique. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：741 / 749

页数：9

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