Kinetics of oxide scale growth on a (Ti, Mo)5Si3 based oxidation resistant Mo-Ti-Si alloy at 900-1300°C

被引:7
作者
Majumdar, Sanjib [1 ]
Singh, Pankaj Kumar [2 ,3 ]
Pandey, Ajoy Kumar [2 ]
Rao, G. V. S. Nageswara [2 ]
机构
[1] Bhabha Atom Res Ctr, Mat Proc & Corros Engn Div, High Temp Mat Dev Sect, Mumbai 400085, Maharashtra, India
[2] Natl Inst Technol, Warangal 506004, Telangana, India
[3] Hiroshima Univ, Grad Sch Adv Sci Matter, Hiroshima 7398530, Japan
关键词
High-temperature; Oxidation; Oxide scale; Kinetics; Activation energy; HIGH-TEMPERATURE OXIDATION; B ALLOYS; THERMAL-OXIDATION; TITANIUM SILICIDE; BEHAVIOR; CREEP; MICROSTRUCTURE;
D O I
10.1515/htmp-2019-0056
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-temperature oxidation behaviour of Mo-40Ti-30Si (at.%) alloy was investigated in the temperature regime of 900-1300 degrees C in air. Isothermal weight change data recorded up to 100 h of exposure revealed parabolic weight gain kinetics at all the tested temperatures. The protective oxide scale composed with SiO2 (silica) and TiO2 (titania) forming a duplex oxide microstructure consisting of TiO2 particles embedded in the continuous SiO2 matrix. The oxide scale showed parabolic growth kinetics, and the activation energies for the scale growth were found to be 72.2 kJ/mol in 900-1200 degrees C and 324.9 kJ/mol in 1200-1300 degrees C. The kinetics of the protective scale growth on the alloy surface was mainly controlled by the growth of the silica film and the inward diffusion of oxygen through the duplex oxide layer.
引用
收藏
页码:533 / 540
页数:8
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