Characterization of two-dimensional hexagonal boron nitride using scanning electron and scanning helium ion microscopy

被引:17
作者
Guo, Hongxuan [1 ]
Gao, Jianhua [2 ]
Ishida, Nobuyuki [2 ]
Xu, Mingsheng [3 ]
Fujita, Daisuke [2 ,4 ]
机构
[1] Natl Inst Mat Sci, Global Res Ctr Environm & Energy Based Nanomat Sc, Tsukuba, Ibaraki 3050047, Japan
[2] Natl Inst Mat Sci, Int Ctr Young Scientists, Tsukuba, Ibaraki 3050047, Japan
[3] Zhejiang Univ, Dept Polymer Sci & Engn, Key Lab Macromol Synth & Functionalizat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
[4] Natl Inst Mat Sci, Global Res Ctr Environm & Energy Based Nanomat Sc, Adv Key Technol Div, Tsukuba, Ibaraki 3050047, Japan
关键词
MEAN FREE PATHS; ATOMIC LAYERS; GRAPHENE; IDENTIFICATION; RANGE;
D O I
10.1063/1.4862819
中图分类号
O59 [应用物理学];
学科分类号
摘要
Characterization of the structural and physical properties of two-dimensional (2D) materials, such as layer number and inelastic mean free path measurements, is very important to optimize their synthesis and application. In this study, we characterize the layer number and morphology of hexagonal boron nitride (h-BN) nanosheets on a metallic substrate using field emission scanning electron microscopy (FE-SEM) and scanning helium ion microscopy (HIM). Using scanning beams of various energies, we could analyze the dependence of the intensities of secondary electrons on the thickness of the h-BN nanosheets. Based on the interaction between the scanning particles (electrons and helium ions) and h-BN nanosheets, we deduced an exponential relationship between the intensities of secondary electrons and number of layers of h-BN. With the attenuation factor of the exponential formula, we calculate the inelastic mean free path of electrons and helium ions in the h-BN nanosheets. Our results show that HIM is more sensitive and consistent than FE-SEM for characterizing the number of layers and morphology of 2D materials. (C) 2014 AIP Publishing LLC.
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页数:4
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