Fabrication of gray-scale masks and diffractive optical elements with LDW-glass

被引:8
作者
Korolkov, V [1 ]
Malyshev, A [1 ]
Poleschuk, A [1 ]
Cherkashin, V [1 ]
Tiziani, HJ [1 ]
Pruss, C [1 ]
Schoder, T [1 ]
Westhauser, J [1 ]
Wu, C [1 ]
机构
[1] Russian Acad Sci, SB, Inst Automat & Electrometry, Novosibirsk 630090 90, Russia
来源
LITHOGRAPHIC AND MICROMACHINING TECHNIQUES FOR OPTICAL COMPONENT FABRICATION | 2001年 / 4440卷
关键词
diffractive optics; LDW-glass; gray-scale mask; direct laser writing;
D O I
10.1117/12.448026
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In the last years the application of gray-scale masks (GSM) for diffractive optics manufacturing attracts attention because of cost-effective possibility to produce a lot of diffractive elements on hard and heat-resistant thermally stable substrates. Direct laser writing of GSMs and fabrication of diffractive optical elements are effectively realized with application of LDW-glass (material for Laser Direct Write from CAN-YON MATERIALS, Inc). An important advantage of this material is the real-time change of transmittance in a single-step process without liquid development. It is shown that optimal transmittance range in which track width is not more than 1 gm is from 5-10% (transmittance of unexposed area) to 60-65% for LDW-glass type I having thinner colored layer. Power modulation and surroundings dependent peculiarities of direct laser writing on LDW-glass are discussed. Results of fabrication of diffractive optical elements using LDW-glass masks are presented. Among several types of LDW glasses studied the advantages of new GS-11 glass are elaborated. Application of GS-I I glass for GSMs allowed to fabricate blazed diffractive structures with backward slope width of 0.8 mum.
引用
收藏
页码:73 / 84
页数:12
相关论文
共 16 条
  • [1] *CAN MAT INC, 9508 CAN MAT INC
  • [2] CHERKASHIN VV, 1997, EOS TOP M DIG SER DI, V12, P222
  • [3] Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass
    Daschner, W
    Long, P
    Stein, R
    Wu, C
    Lee, SH
    [J]. APPLIED OPTICS, 1997, 36 (20): : 4675 - 4680
  • [4] BLAZED GRATINGS AND FRESNEL LENSES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY
    FUJITA, T
    NISHIHARA, H
    KOYAMA, J
    [J]. OPTICS LETTERS, 1982, 7 (12) : 578 - 580
  • [5] GOTCHIYAEV VZ, 1988, P 3 INT S MOD OPT BU, V2, P446
  • [6] Analysis and optimization of fabrication of continuous-relief diffractive optical elements
    Hessler, T
    Rossi, M
    Kunz, RE
    Gale, MT
    [J]. APPLIED OPTICS, 1998, 37 (19): : 4069 - 4079
  • [7] Application of gray-scale LDW-glass masks for fabrication of high-efficiency DOEs
    Korolkov, VP
    Malyshev, AI
    Nikitin, VG
    Poleshchuk, AG
    Kharissov, AA
    Cherkashin, VV
    Wu, C
    [J]. DIFFRACTIVE AND HOLOGRAPHIC TECHNOLOGIES, SYSTEMS, AND SPATIAL LIGHT MODULATORS VI, 1999, 3633 : 129 - 138
  • [8] Subwavelength-resolvable focused non-Gaussian beam shaped with a binary diffractive optical element
    Wang, MR
    Huang, XG
    [J]. APPLIED OPTICS, 1999, 38 (11) : 2171 - 2176
  • [9] WU C, 1993, IEEE SPECTRUM OCT, P68
  • [10] WU C, Patent No. 4894303