Formation of GaAsP interface layers monitored by reflectance anisotropy spectroscopy

被引:6
作者
Kurpas, P [1 ]
Oster, A [1 ]
Weyers, M [1 ]
Rumberg, A [1 ]
Knorr, K [1 ]
Richter, W [1 ]
机构
[1] TECH UNIV BERLIN,INST FESTKORPERPHYS,SEKR PN 6 1,D-10623 BERLIN,GERMANY
关键词
GaAs; GaAsP; interface layer; in-situ monitoring; metalorganic vapor phase epitaxy (MOVPE); reflectance anisotropy spectroscopy (RAS);
D O I
10.1007/s11664-997-0013-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Reflectance anisotropy spectroscopy (RAS) has been used to study As-by-P exchange during metalorganic vapor phase epitaxy. The study focuses on the processes occurring during switching from GaAs to GaInP, especially the effect of purging PH3 over a GaAs surface. GaAsP/GaAs superlattices of different periodicity were grown and the P-content was determined by high-resolution xray diffraction and correlated to the RAS spectra. From the temperature dependence of the P-content, an activation energy of 0.56 eV was estimated for the incorporation mechanism. In addition to the insights into the processes at mixed group-V heterointerfaces, our study demonstrates the reproducibility of RAS transients that thus can be used for process monitoring.
引用
收藏
页码:1159 / 1163
页数:5
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