Design and fabrication of low-threshold 1.55-mu m graded-index separate-confinement heterostructure strained InGaAsP single-quantum-well laser diodes

被引:2
作者
Yamamoto, N
Yokoyama, K
Yamanaka, T
Yamamoto, M
机构
[1] NTT Opto-electronics Laboratories
关键词
current; indium; quantum-well lasers; semiconductor lasers; strain;
D O I
10.1109/3.594876
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a guideline for designing an optimum low-threshold 1.55-mu m graded-index (GRIN) separate-confinement-heterostructure (SCH) strained InGaAsP single-quantum-well (SQW) laser diode (LD), The guideline was formulated based on the results of numerical and experimental analysis, After calculating the sheet carrier density at the lasing threshold, the guideline was obtained by considering the tradeoff between carrier and optical confinements in the well: the GRIN layer energy gap should be varied parabolically from InP to InGaAsP having a band gap wavelength of 1.1 mu m to inject a large number of carriers into the well, and the thickness of one side of the GRIN layer should be more than 300 nm to keep a strong optical confinement. The GRIN SQW LD designed using the guideline has a J(th) as low as 98 A/cm(2) at a cavity length of 5 mm, which proves the guideline is effective for designing low-threshold 1.55-mu m GRIN SQW LD's.
引用
收藏
页码:1141 / 1148
页数:8
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