Mechanism of surface nanocrystallization in pure nickel induced by high-current pulsed electron beam

被引:12
作者
Cheng Du-Qing [1 ]
Guan Qing-Feng [1 ]
Zhu Jian [1 ]
Qiu Dong-Hua [1 ]
Cheng Xiu-Wei [1 ]
Wang Xue-Tao [1 ]
机构
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
基金
中国国家自然科学基金;
关键词
high-current pulsed electron beam; nanocrystalline structrue; polycrystalline pure nickel; dislocation wall; NANOSTRUCTURE; COPPER;
D O I
10.7498/aps.58.7300
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
High-current pulsed electron beam (HCPEB) technique was applied to irradiate the samples of polycrystalline pure nickel. Microstructures of the irradiated surface and sub-surface were investigated by using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The experimental results show that the surface layer melted, and 2 mu m depth remelted layer was formed on the top surface. Superfast solidification of melted layer results in the formation of nano-structure of 80 rim grain size in the remelted layer. In the sub-surface regions, the structures of dislocation walls and sub-dislocation walls in it with band shape were induced by severe plastic deformation, which become the dominant structures 5-15 mu m below the irradiated surface. Those defect structures crossing with each other results in grain refinement, and nanocrystal grains about 10 rim in size were produced in the sub-surface layer.
引用
收藏
页码:7300 / 7306
页数:7
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