Monte Carlo studies of effects of substrate size on water-substrate interaction energy and wafer structure

被引:24
作者
Fang, JX [1 ]
Marlow, WH [1 ]
Lu, JX [1 ]
Lucchese, RR [1 ]
机构
[1] TEXAS A&M UNIV, DEPT CHEM, COLLEGE STN, TX 77843 USA
关键词
D O I
10.1063/1.474884
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Water on a planar substrate and on spherical substrates of radii r = 10, 15, and 20 Angstrom are studied at temperatures of 200, 240, 270, and 290 K by Monte Carlo simulations, The average water-water potential energies and the average water-substrate interaction energies are obtained by use of the single point charge model for the water-water interaction and the nonsingular van der Waals potential plus the Born-type repulsive potential for the water-substrate interaction, Water structure and water-substrate interaction energy are shown to be sensitive to substrate cite. (C) 1997 American Institute of Physics.
引用
收藏
页码:5212 / 5216
页数:5
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